Electron beam irradiation for structuring of molecular assemblies

Abstract

Nontraditional applications of electron beam irradiation for patterning of molecular assemblies are considered. The electron beam can have the following effects on molecular layers: destruction of molecular structure under e-beam irradiation with a successive formation of new molecular system when the irradiation is stopped; variation of the properties of the layer after e-beam irradiation; crosslinking of molecules in the layer under irradiation; modification of the templates for the successive film growth, providing different growing conditions in irradiated and nonirradiated areas; and activation of the solid support surface and molecular systems in the film resulting in the increased adhesion of the layer to the substrate in irradiated areas. All these effects were used for patterning of thin layers of different compounds. Five classes of molecular systems were considered, namely, films of simple surfactant molecules, layers of charge-transfer complexes, films of conducting polymers, aggregated nanoparticulate layers and films of nanoengineered polymeric capsules. Characteristic features of patterning processes in each particular case are discussed.