Voltage-induced metal-insulator transition in polythiophene field-effect transistors
- PMID: 16907261
- DOI: 10.1103/PhysRevLett.96.246403
Voltage-induced metal-insulator transition in polythiophene field-effect transistors
Abstract
We have extensively studied the carrier transport in regio-regular polythiophene field-effect transistors (FETs) from room temperature to 4.2 K. At low temperatures, Zabrodskii plots (dlnsigma/dlnT) demonstrate that the gate voltage and source-drain voltage combine to induce the insulator-to-metal transition at a carrier density of 5x10(12) cm-2. The carrier transport in the insulating regime is well described by phonon assisted hopping in a disordered Fermi glass with Coulomb interaction between the hopping charge carrier and the opposite charge left behind, as described by Efros and Shklovskii.
Comment in
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Comment on "voltage-induced metal-insulator transition in polythiophene field-effect transistors".Phys Rev Lett. 2007 Jun 22;98(25):259703. doi: 10.1103/PhysRevLett.98.259703. Epub 2007 Jun 22. Phys Rev Lett. 2007. PMID: 17678068 No abstract available.
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