Skip to main page content
U.S. flag

An official website of the United States government

Dot gov

The .gov means it’s official.
Federal government websites often end in .gov or .mil. Before sharing sensitive information, make sure you’re on a federal government site.

Https

The site is secure.
The https:// ensures that you are connecting to the official website and that any information you provide is encrypted and transmitted securely.

Access keys NCBI Homepage MyNCBI Homepage Main Content Main Navigation
. 2007 Jul 27;99(4):044501.
doi: 10.1103/PhysRevLett.99.044501. Epub 2007 Jul 25.

Concentration polarization and nonlinear electrokinetic flow near a nanofluidic channel

Affiliations

Concentration polarization and nonlinear electrokinetic flow near a nanofluidic channel

Sung Jae Kim et al. Phys Rev Lett. .

Abstract

A perm-selective nanochannel could initiate concentration polarization near the nanochannel, significantly decreasing (increasing) the ion concentration in the anodic (cathodic) end of the nanochannel. Such strong concentration polarization can be induced even at moderate buffer concentrations because of local ion depletion (therefore thicker local Debye layer) near the nanochannel. In addition, fast fluid vortices were generated at the anodic side of the nanochannel due to the nonequilibrium electro-osmotic flow (EOF), which was at least approximately 10x faster than predicted from any equilibrium EOF. This result corroborates the relation among induced EOF, concentration polarization, and limiting-current behavior.

PubMed Disclaimer

Figures

Figure 1
Figure 1
(color online). (a) Schematic diagram of ion concentration distribution front and back of perm-selective material which only let cations pass through. Ions in anodic side were depleted while they were enriched in cathodic side. Schematic configurations of (b) single gate device (SG) and (c) dual gate device (DG). GND is electrical ground.
Figure 2
Figure 2
(a) The basic ion-enrichment and ion-depletion behavior in SG device. (b) The time required for the depletion boundary to reach opposite microchannel wall as functions of applied voltage and buffer concentrations. (c) Current sweep plot showing the limiting current and overlimiting current pattern. (d) With the influence of the irregular nonlinear flow merging and mixing, fluctuations can often be observed in the overlimiting region.
Figure 2
Figure 2
(a) The basic ion-enrichment and ion-depletion behavior in SG device. (b) The time required for the depletion boundary to reach opposite microchannel wall as functions of applied voltage and buffer concentrations. (c) Current sweep plot showing the limiting current and overlimiting current pattern. (d) With the influence of the irregular nonlinear flow merging and mixing, fluctuations can often be observed in the overlimiting region.
Figure 3
Figure 3
(color online). (a) The linear velocity and angular velocity of the vortex as a function of applied voltage. (b) Fast vortex at steady state in SG device. (c) Four independent strong vortices in DG device. Suppressed vortices in (d) SSG and (e) SDG device. The size of the vortex was _2 μm, which was similar value of the microchannel depth. See supplementary videos [9].

Similar articles

Cited by

References

    1. Mao P, Han J. Lab Chip. 2005;5:837. - PubMed
    1. Han J, Craighead HG. Science. 2000;288:1026. - PubMed
    2. Huang LR, et al. Nat. Biotechnol. 2002;20:1048. - PubMed
    3. Saleh OA, Sohn LL. Nano Lett. 2003;3:37.
    4. Karnik R, et al. Nano Lett. 2005;5:1638. - PubMed
    5. Fu J, et al. Nature Nanotechnology. 2007;2:121. - PMC - PubMed
    1. Wang Y-C, Stevens AL, Han J. Anal. Chem. 2005;77:4293. - PubMed
    1. Pu Q, et al. Nano Lett. 2004;4:1099.
    2. Plecis A, Schoch RB, Renaud P. Nano Lett. 2005;5:1147. - PubMed
    3. Schoch RB, Renaud P. Appl. Phys. Lett. 2005;86:253111.
    4. Stein D, Kruithof M, Dekker C. Phys. Rev. Lett. 2004;93:035901. - PubMed
    1. Squires TM, Bazant MZ. J. Fluid Mech. 2004;509:217.

Publication types