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. 2008 Mar;8(3):1234-7.

Behavior of TiO2 thin film in a nanocapacitor

Dongdong Jia  1 , C Shaffer, S Pickering, A Goonewardene, Xiao-Jun Wang
Affiliations
  • PMID: 18468130

Behavior of TiO2 thin film in a nanocapacitor

Dongdong Jia et al. J Nanosci Nanotechnol. 2008 Mar.

Abstract

Gold and platinum nanocapacitors have been fabricated using a magnetron sputtering technique. TiO2 is used as a dielectric material to separate the metal layers which act as the parallel plates for the capacitors. The thickness for metal films and TiO2 layer is 80 nm and 400 nm, respectively. Capacitance of the nanocapacitors has been measured and dielectric constant of TiO2 calculated. Both capacitance and dielectric constant are observed to have strong frequency dependence.

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