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. 2008 Dec;39(8):1145-8.
doi: 10.1016/j.micron.2008.05.010. Epub 2008 Jun 20.

Elaboration and characterization of barium silicate thin films

T Genevès  1 , B Domenichini, L Imhoff, V Potin, O Heintz, P M Peterlé, S Bourgeois
Affiliations

Elaboration and characterization of barium silicate thin films

T Genevès et al. Micron. 2008 Dec.

Abstract

Room temperature depositions of barium on a thermal silicon oxide layer were performed in ultra high vacuum (UHV). In-situ X-ray photoelectron spectroscopy (XPS) analyses were carried out as well after exposure to air as after subsequent annealings. These analyses were ex-situ completed by secondary ion mass spectrometry (SIMS) profiles and transmission electron microscopy (TEM) cross-sectional images. The results showed that after air exposure, the barium went carbonated. Annealing at sufficient temperature permitted to decompose the carbonate to benefit of a barium silicate. The silicate layer was formed by interdiffusion of barium with the initial SiO2 layer.

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