doi: 10.1126/science.2020853.
Deep UV photochemistry of chemisorbed monolayers: patterned coplanar molecular assemblies
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- PMID: 2020853
- DOI: 10.1126/science.2020853
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Deep UV photochemistry of chemisorbed monolayers: patterned coplanar molecular assemblies
Science.
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Abstract
Deep ultraviolet (UV) irradiation is shown to modify organosilane self-assembled monolayer (SAM) films by a photocleavage mechanism, which renders the surface amenable to further SAM modification. Patterned UV exposure creates alternating regions of intact SAM film and hydrophilic, reactive sites. The exposed regions can undergo a second chemisorption reaction to produce an assembly of SAMs in the same molecular plane with similar substrate attachment chemistry. The UV-patterned films are used as a template for selective buildup of fluorophores, metals, and biological cells.
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