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. 2010 Jun 15;4(2):026503.
doi: 10.1063/1.3437589.

E-beam lithography for micro-nanofabrication

Matteo Altissimo  1
Affiliations

E-beam lithography for micro-nanofabrication

Matteo Altissimo. Biomicrofluidics. .

Abstract

Electron beam lithography (EBL) is one of the tools of choice for writing micro- and nanostructures on a wide variety of materials. This is largely due to the fact that modern EBL machines are capable of writing nanometer-sized structures on areas up to mm(2). The aim of this contribution is to give technical and practical backgrounds in this extremely flexible nanofabrication technique.

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Figures

Figure 1
Figure 1
Classification of EBL systems according to beam shape.
Figure 2
Figure 2
A typical EBL system, consisting of a chamber, an electron gun, a column containing all the electron optics needed to focus, scan, and turn on or turn off the electron beam.
See this image and copyright information in PMC

References

    1. Chang T. H. P., Ph.D. thesis, Cambridge University, 1967.
    1. Hatzakis M., J. Electrochem. Soc. JESOAN 116, 1033 (1969).10.1149/1.2412145 - DOI
    1. Matsuzaka T. and Soda Y., Hitachi Rev. HITAAQ 6, 340 (1999).
    1. Pfeiffer H. C., Groves T. R., and Newman T. H., IBM J. Res. Dev. IBMJAE 32, 494 (1988).10.1147/rd.324.0494 - DOI
    1. Shy S. -L., Yew J. Y., Nakamura K., and Chang C. -Y., Proc. SPIE PSISDG 2884, 334 (1996).

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