GaS and GaSe ultrathin layer transistors
- PMID: 22678832
- DOI: 10.1002/adma.201201361
GaS and GaSe ultrathin layer transistors
Abstract
Room-temperature, bottom-gate, field-effect transistor characteristics of 2D ultrathin layer GaS and GaSe prepared from the bulk crystals using a micromechanical cleavage technique are reported. The transistors based on active GaS and GaSe ultrathin layers demonstrate typical n-and p-type conductance transistor operation along with a good ON/OFF ratio and electron differential mobility.
Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
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