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. 2012 Oct;75(10):1432-6.
doi: 10.1002/jemt.22086. Epub 2012 Jun 20.

Persistence of endodontic methacrylate-based cement residues on dentin adhesive surface treated with different chemical removal protocols

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Persistence of endodontic methacrylate-based cement residues on dentin adhesive surface treated with different chemical removal protocols

Milton Carlos Kuga et al. Microsc Res Tech. 2012 Oct.

Abstract

The aim of this study was to evaluate the persistence of methacrylate-based cement residues on the dentin, after dentin surface cleaning with ethanol or acetone, with or without previous application of a dentin adhesive. Forty bovine crown fragments were obtained and the dentin surface was washed with 1.0 mL of 2.5% sodium hypochlorite (NaOCl), followed by 0.1 mL of 17% ethylenediaminetetraacetic acid application for 3 min, and final irrigation with 2.5% NaOCl. The specimens were air dried and resin-based cement was rubbed onto the dentine surface with a microbrush applicator. In 20 specimens, previously to cement, a dentin adhesive was applied in all surfaces. After 15 min, the surface was scrubbed with a cotton pellet and moistened with ethanol or acetone, compounding the following groups: G1-99.5% ethanol and G2-acetone, without previous use of dentin adhesive; G3-99.5% ethanol and G4-acetone, with previous use of dentin adhesive. The dentin surface was scrubbed until the cement residues could not be visually detected. Sections were then processed for scanning electron microscopy and evaluated at 500× magnification and scores were attributed to each image according to the area covered by residual sealer, and data were subjected to Kruskal-Wallis at 5% significance. The lower residue presence was observed in G3 (P = 0.005). All surface presented cement residues when acetone was used as cleaning solution (P = 0.0005). The cleaning solutions were unable to completely remove the cement residues from both surfaces. The ethanol used after previous application of the dentin adhesive promoted the lower presence of residues.

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