Experimental evidence for epitaxial silicene on diboride thin films
- PMID: 23004288
- DOI: 10.1103/PhysRevLett.108.245501
Experimental evidence for epitaxial silicene on diboride thin films
Abstract
As the Si counterpart of graphene, silicene may be defined as an at least partially sp2-hybridized, atom-thick honeycomb layer of Si that possesses π-electronic bands. Here we show that two-dimensional, epitaxial silicene forms through surface segregation on zirconium diboride thin films grown on Si wafers. A particular buckling of silicene induced by the epitaxial relationship with the diboride surface leads to a direct π-electronic band gap at the Γ point. These results demonstrate that the buckling and thus the electronic properties of silicene are modified by epitaxial strain.
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