Electron-beam lithography: going green with silk
- PMID: 24658172
- DOI: 10.1038/nnano.2014.70
Electron-beam lithography: going green with silk
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All-water-based electron-beam lithography using silk as a resist.Nat Nanotechnol. 2014 Apr;9(4):306-10. doi: 10.1038/nnano.2014.47. Epub 2014 Mar 23. Nat Nanotechnol. 2014. PMID: 24658173
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