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. 2016 Apr 6;28(13):2624-8.
doi: 10.1002/adma.201505552. Epub 2016 Jan 28.

Athermal Azobenzene-Based Nanoimprint Lithography

Christian Probst  1 , Christoph Meichner  2 , Klaus Kreger  1 , Lothar Kador  2 , Christian Neuber  1 , Hans-Werner Schmidt  1
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Athermal Azobenzene-Based Nanoimprint Lithography

Christian Probst et al. Adv Mater. .

Abstract

A novel nanoimprint lithography technique based on the photofluidization effect of azobenzene materials is presented. The tunable process allows for imprinting under ambient conditions without crosslinking reactions, so that shrinkage of the resist is avoided. Patterning of surfaces in the regime from micrometers down to 100 nm is demonstrated.

Keywords: athermal photofluidization; azobenzene; nanoimprint lithography; nanopatterning; soft lithography.

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