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Comment

. 2017 Jul;12(6):507-508.

doi: 10.1038/nnano.2017.49. Epub 2017 Mar 27.

Directed self-assembly: A dress code for block copolymers

Christopher K Ober¹

Affiliations

PMID: 28346459
DOI: 10.1038/nnano.2017.49

Comment

Directed self-assembly: A dress code for block copolymers

Christopher K Ober. Nat Nanotechnol. 2017 Jul.

. 2017 Jul;12(6):507-508.

doi: 10.1038/nnano.2017.49. Epub 2017 Mar 27.

Author

Christopher K Ober¹

Affiliation

¹ Department of Materials Science and Engineering, Cornell University, Ithaca, New York 14853-1501, USA.

PMID: 28346459
DOI: 10.1038/nnano.2017.49

No abstract available

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Comment on

Sub-10-nm patterning via directed self-assembly of block copolymer films with a vapour-phase deposited topcoat.
Suh HS, Kim DH, Moni P, Xiong S, Ocola LE, Zaluzec NJ, Gleason KK, Nealey PF. Suh HS, et al. Nat Nanotechnol. 2017 Jul;12(6):575-581. doi: 10.1038/nnano.2017.34. Epub 2017 Mar 27. Nat Nanotechnol. 2017. PMID: 28346456

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