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Review
. 2018 Feb 20;13(1):56.
doi: 10.1186/s11671-018-2463-z.

Solid-State Nanopore

Zhishan Yuan  1 , Chengyong Wang  2 , Xin Yi  3 , Zhonghua Ni  4 , Yunfei Chen  4 , Tie Li  5
Affiliations
Review

Solid-State Nanopore

Zhishan Yuan et al. Nanoscale Res Lett. .

Abstract

Solid-state nanopore has captured the attention of many researchers due to its characteristic of nanoscale. Now, different fabrication methods have been reported, which can be summarized into two broad categories: "top-down" etching technology and "bottom-up" shrinkage technology. Ion track etching method, mask etching method chemical solution etching method, and high-energy particle etching and shrinkage method are exhibited in this report. Besides, we also discussed applications of solid-state nanopore fabrication technology in DNA sequencing, protein detection, and energy conversion.

Keywords: Applications; Fabrication; Solid-state nanopore.

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Conflict of interest statement

Competing Interests

The authors declare that they have no competing interests.

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Figures

Fig. 1
Fig. 1
Solid-state nanopore manufacturing technology development roadmap
Fig. 2
Fig. 2
Preparation of solid-state nanopore by mask etching methods. (a) GaAs solid-state nanopore [25], (b) silicon nanopore [33], and (c) aluminum nanopore with different shapes [34]
Fig. 3
Fig. 3
Preparation of solid-state nanopore by chemical solution etching. (a) Double-walled silicon nanopore [38], (b) silicon nanopore [27], and (c) highly controllable silicon nanopore [28]
Fig. 4
Fig. 4
High-energy particle etching and modification methods for the fabrication of solid-state nanopore. (a) ALD shrinkage, (b) self-calibration of nanopore edge, and (c) helium ion etching nanopore
Fig. 5
Fig. 5
Total internal reflection fluorescence (FTIR) parallel detection of DNA sequence [58]. a Schematic diagram. b Signal map of optical and ion current signals detected in the experiment
See this image and copyright information in PMC

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