One-dimensional angular-measurement-based stitching interferometry

Abstract

In this work, we present one-dimensional stitching interferometry based on the angular measurement for high-precision mirror metrology. The tilt error introduced by the stage motion during the stitching process is measured by an extra angular measurement device. The local profile measured by the interferometer in a single field of view is corrected using the measured angle before the piston adjustment in the stitching process. Comparing to the classical software stitching technique, the angle measuring stitching technique is more reliable and accurate in profiling mirror surface at the nanometer level. Experimental results demonstrate the feasibility of the proposed stitching technique. Based on our measurements, the typical repeatability within 200 mm scanning range is 0.5 nm RMS or less.