A silicon metal-oxide-semiconductor electron spin-orbit qubit
- PMID: 29720586
- PMCID: PMC5931988
- DOI: 10.1038/s41467-018-04200-0
A silicon metal-oxide-semiconductor electron spin-orbit qubit
Abstract
The silicon metal-oxide-semiconductor (MOS) material system is a technologically important implementation of spin-based quantum information processing. However, the MOS interface is imperfect leading to concerns about 1/f trap noise and variability in the electron g-factor due to spin-orbit (SO) effects. Here we advantageously use interface-SO coupling for a critical control axis in a double-quantum-dot singlet-triplet qubit. The magnetic field-orientation dependence of the g-factors is consistent with Rashba and Dresselhaus interface-SO contributions. The resulting all-electrical, two-axis control is also used to probe the MOS interface noise. The measured inhomogeneous dephasing time, [Formula: see text], of 1.6 μs is consistent with 99.95% 28Si enrichment. Furthermore, when tuned to be sensitive to exchange fluctuations, a quasi-static charge noise detuning variance of 2 μeV is observed, competitive with low-noise reports in other semiconductor qubits. This work, therefore, demonstrates that the MOS interface inherently provides properties for two-axis qubit control, while not increasing noise relative to other material choices.
Conflict of interest statement
The authors declare no competing interests.
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    - Rochette, S. et al. Single-electron-occupation metal-oxide-semiconductor quantum dots formed from efficient poly-silicon gate layout. Preprint at http://arxiv.org/abs/1707.03895 (2017).Ne
 
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