New Insights into RAFT Dispersion Polymerization-Induced Self-Assembly: From Monomer Library, Morphological Control, and Stability to Driving Forces

Abstract

Polymerization-induced self-assembly (PISA) has been established as an efficient, robust, and versatile approach to synthesize various block copolymer nano-objects with controlled morphologies, tunable dimensions, and diverse functions. The relatively high concentration and potential scalability makes it a promising technique for industrial production and practical applications of functional polymeric nanoparticles. This feature article outlines recent advances in PISA via reversible addition-fragmentation chain transfer dispersion polymerization. Considerable efforts to understand morphological control, broaden the monomer library, enhance morphological stability, and incorporate multiple driving forces in PISA syntheses are summarized herein. Finally, perspectives on the future of PISA research are discussed.

Keywords: RAFT dispersion polymerization; block copolymers; cross-linking; nanoparticles; polymerization-induced self-assembly.