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. 2018 Sep 18;8(9):737.
doi: 10.3390/nano8090737.

Exfoliation and Characterization of V₂Se₉ Atomic Crystals

Affiliations

Exfoliation and Characterization of V₂Se₉ Atomic Crystals

Bum Jun Kim et al. Nanomaterials (Basel). .

Abstract

Mass production of one-dimensional, V₂Se₉ crystals, was successfully synthesized using the solid-state reaction of vanadium and selenium. Through the mechanical exfoliation method, the bulk V₂Se₉ crystal was easily separated to nanoribbon structure and we have confirmed that as-grown V₂Se₉ crystals consist of innumerable single V₂Se₉ chains linked by van der Waals interaction. The exfoliated V₂Se₉ flakes can be controlled thickness by the repeated-peeling method. In addition, atomic thick nanoribbon structure of V₂Se₉ was also obtained on a 300 nm SiO₂/Si substrate. Scanning Kelvin probe microscopy analysis was used to explore the variation of work function depending on the thickness of V₂Se₉ flakes. We believe that these observations will be of great help in selecting suitable metal contacts for V₂Se₉ and that a V₂Se₉ crystal is expected to have an important role in future nano-electronic devices.

Keywords: V2Se9; atomic crystal; mechanical exfoliation; scanning Kelvin probe microscopy.

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Conflict of interest statement

The authors declare no conflict of interest.

Figures

Figure 1
Figure 1
(a) Photo-image of mass production of V2Se9 crystal. (b) XRD pattern of V2Se9 crystal. (c) Low- and (d) high-magnification SEM images of V2Se9 crystal. The inset shows an illustration of the crystal structure of V2Se9.
Figure 2
Figure 2
(a) Atomic force microscopy (AFM) image of the 1D V2Se9 flake on 300 nm SiO2/Si substrate. (b) Line-profile of a V2Se9 flake as marked in Figure 2a.
Figure 3
Figure 3
(a) AFM image of exfoliated V2Se9 on 300 nm SiO2/Si substrate. (b) AFM image of additionally exfoliated V2Se9 on 300 nm SiO2/Si substrate. (c) Line-profile of 1D V2Se9 flakes on 300 nm SiO2/Si substrate before and after 2nd exfoliation.
Figure 4
Figure 4
(a) AFM image of the V2Se9 nanoribbon on the 300 nm SiO2/Si substrate. The inset shows an illustration of the V2Se9 nanoribbon. (b) Line-profiles of the V2Se9 nanoribbon as marked L1, L2, L3, and L4 in Figure 4a.
Figure 5
Figure 5
(a) Scanning Kelvin probe microscopy (SKPM) image of exfoliated 1D V2Se9 flakes on the Si substrate. (b,c) Height and potential energy profiles of the V2Se9 flakes and Si substrate as labeled in Figure 5a. (d,e) Variation in potential energy difference and work function depending as a function of thickness of V2Se9 flakes.

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