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. 2019 Apr 2:7:183.
doi: 10.3389/fchem.2019.00183. eCollection 2019.

Atmospheric Aerosol Assisted Pulsed Plasma Polymerization: An Environmentally Friendly Technique for Tunable Catechol-Bearing Thin Films

Vincent Jalaber  1 , Doriane Del Frari  1 , Julien De Winter  2 , Kahina Mehennaoui  3 , Sébastien Planchon  3 , Patrick Choquet  1 , Christophe Detrembleur  4 , Maryline Moreno-Couranjou  1
Affiliations

Atmospheric Aerosol Assisted Pulsed Plasma Polymerization: An Environmentally Friendly Technique for Tunable Catechol-Bearing Thin Films

Vincent Jalaber et al. Front Chem. .

Abstract

In this work, an atmospheric aerosol assisted pulsed plasma process is reported as an environmentally friendly technique for the preparation of tunable catechol-bearing thin films under solvent and catalyst free conditions. The approach relies on the direct injection of dopamine acrylamide dissolved in 2-hydroxyethylmethacrylate as comonomer into the plasma zone. By adjusting the pulsing of the electrical discharge, the reactive plasma process can be alternatively switch ON (tON) and OFF (tOFF) during different periods of time, thus allowing a facile and fine tuning of the catechol density, morphology and deposition rate of the coating. An optimal tON/tOFF ratio is established, that permits maximizing the catechol content in the deposited film. Finally, a diagram, based on the average energy input into the process, is proposed allowing for easy custom synthesis of layers with specific chemical and physical properties, thus highlighting the utility of the developed dry plasma route.

Keywords: coating; dry process; plasma polymerization; surface modification; tunable catechol films.

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Figures

Figure 1
Figure 1
Schematic representation of the atmospheric aerosol assisted plasma process.
Figure 2
Figure 2
(A) Example of pulsed voltage with tON of 5 ms and tOFF of 15 ms (B) mass deposited per pulse (i.e., tON + tOFF) for a 15 ms tOFF and tON values ranging from 1 to 15 ms (error bars: means ± SD, n = 3).
Figure 3
Figure 3
SEM pictures for coatings deposited at 15 ms tOFF and tON of: (A) 1 ms, (B) 5 ms, and (C) 10 ms. AFM pictures for coatings deposited at 15 ms tOFF and tON of: (D) 5 ms and (E) 10 ms.
Figure 4
Figure 4
pp(DOA-HEMA) layers deposited at 15 ms tOFF and tON ranging from 1 to 15 ms. (A) Normalized FT-IR spectra, HEMA is given as reference, (B) UV spectra.
Figure 5
Figure 5
Dark field microscopy images of solutions resulting from pplayers immersed during 24 h in an AgNO3 solution at 1 mg ml−1 for pplayer deposited at 1:15 ms (A) and 10:15 ms (B).
Figure 6
Figure 6
Table summarizing XPS analyses for pp(HEMA) and pp(DOA-HEMA) deposited at 1:15 ms and 10:15 ms (A), XPS C1s envelope overlaps of pp(DOA-HEMA) deposited at 1 and 15ms tON and 15 ms tOFF(B).
Figure 7
Figure 7
Evolution of the layer thickness and mass deposited per pulse for different tOFF durations and a fixed 1ms tON (error bars: means ± SD, n = 3).
Figure 8
Figure 8
SEM (A) and AFM (B) pictures of pp(DOA-HEMA) deposited at 1:400 ms.
Figure 9
Figure 9
pp(DOA-HEMA) deposited at 1 ms tON and different tOFF duration: Normalized FT-IR spectra (A) and UV analyses (B).
Figure 10
Figure 10
XPS analysis of pp(DOA-HEMA) deposited at 1:15 ms and 1:400 ms (A). XPS C1s envelope overlaps of pp(DOA-HEMA) deposited at 1:15 ms (black curve) and 1:400 ms (red curve) (B).
Figure 11
Figure 11
ESI mass spectrum recorded for a pp(DOA-HEMA) deposited in a 1:400 ms pulsed mode.
Figure 12
Figure 12
Evolution of the film catechol content, deposition rates and morphological trends as a function of Wa/F. Zone I is defined by a 1 ms tON and tOFF ranging from 15 to 800 ms. Zone II is defined by a 15 ms tOFF and tON ranging from 1 to 15 ms.
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