Chemical Vapour Deposition of Graphene-Synthesis, Characterisation, and Applications: A Review
- PMID: 32854226
- PMCID: PMC7503287
- DOI: 10.3390/molecules25173856
Chemical Vapour Deposition of Graphene-Synthesis, Characterisation, and Applications: A Review
Abstract
Graphene as the 2D material with extraordinary properties has attracted the interest of research communities to master the synthesis of this remarkable material at a large scale without sacrificing the quality. Although Top-Down and Bottom-Up approaches produce graphene of different quality, chemical vapour deposition (CVD) stands as the most promising technique. This review details the leading CVD methods for graphene growth, including hot-wall, cold-wall and plasma-enhanced CVD. The role of process conditions and growth substrates on the nucleation and growth of graphene film are thoroughly discussed. The essential characterisation techniques in the study of CVD-grown graphene are reported, highlighting the characteristics of a sample which can be extracted from those techniques. This review also offers a brief overview of the applications to which CVD-grown graphene is well-suited, drawing particular attention to its potential in the sectors of energy and electronic devices.
Keywords: CVD; NEMS; characterisation; deposition; flexible electronics; graphene; growth.
Conflict of interest statement
The authors declare no conflict of interest.
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- Novoselov K.S., Geim A.K. The rise of graphene.pdf. Nat. Mater. 2007;6:183–191. - PubMed
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