Quantitative X-ray Channel-Cut Crystal Diffraction Wavefront Metrology Using the Speckle Scanning Technique
- PMID: 33233739
- PMCID: PMC7699849
- DOI: 10.3390/s20226660
Quantitative X-ray Channel-Cut Crystal Diffraction Wavefront Metrology Using the Speckle Scanning Technique
Abstract
A speckle-based method for the X-ray crystal diffraction wavefront measurement is implemented, and the slope errors of channel-cut crystals with different surface characteristics are measured. The method uses a speckle scanning technique generated by a scattering membrane translated using a piezo motor to infer the deflection of X-rays from the crystals. The method provides a high angular sensitivity of the channel-cut crystal slopes in both the tangential and sagittal directions. The experimental results show that the slope error of different cutting and etching processes ranges from 0.25 to 2.98 μrad. Furthermore, the results of wavefront deformation are brought into the beamline for simulation. This method opens up possibilities for new high-resolution applications for X-ray crystal diffraction wavefront measurement and provides feedback to crystal manufacturers to improve channel-cut fabrication.
Keywords: X-ray crystal diffraction wavefront; channel-cut crystal; speckle-based method.
Conflict of interest statement
The authors declare no conflict of interest.
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References
-
- Kupp T., Blank B., Deyhim A., Benson C., Robinson I., Fuoss P. Development of a Double Crystal Monochromator. In: Warwick T., Arthur J., Padmore H.A., Stöhr J., editors. AIP Conference Series Eighth International Conference on Synchrotron Radiation Instrumentation, San Francisco, CA, USA, 25–29 August 2003. Volume 705. American Institute of Physics; New York, NY, USA: 2004. pp. 651–654.
-
- Hrdy J. Fixed-exit channel-cut crystal X-ray monochromators for synchrotron radiation. Czech. J. Phys. B. 1989;39:261–265. doi: 10.1007/BF01597779. - DOI
-
- Kasman E., Montgomery J., Huang X., Lerch J., Assoufid L. Strain-free polished channel-cut crystal monochromators: A new approach and results. SPIE. 2017;13:10387.
-
- Siewert F., Noll T., Schlegel T., Zeschke T., Lammert H. The Nanometer Optical Component Measuring Machine: A New Sub-Nm Topography Measuring Device for X-ray Optics at BESSY. In: Warwick T., Arthur J., Padmore H.A., Stöhr J., editors. AIP Conference Series Eighth International Conference on Synchrotron Radiation Instrumentation, San Francisco, CA, USA, 25–29 August 2003. Volume 705. American Institute of Physics; New York, NY, USA: 2004. pp. 847–850.
-
- Mimura H., Yumoto H., Matsuyama S., Yamamura K., Sano Y., Ueno K., Endo K., Mori Y., Yabashi M., Tamasaku K., et al. Relative angle determinable stitching interferometry for hard X-ray reflective optics. Rev. Sci. Instrum. 2005;76:045102. doi: 10.1063/1.1868472. - DOI
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