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. 2021 Aug 31;12(9):1061.
doi: 10.3390/mi12091061.

Influence of the Surface Material and Illumination upon the Performance of a Microelectrode/Electrolyte Interface in Optogenetics

Affiliations

Influence of the Surface Material and Illumination upon the Performance of a Microelectrode/Electrolyte Interface in Optogenetics

Junyu Shen et al. Micromachines (Basel). .

Abstract

Integrated optrodes for optogenetics have been becoming a significant tool in neuroscience through the combination of offering accurate stimulation to target cells and recording biological signals simultaneously. This makes it not just be widely used in neuroscience researches, but also have a great potential to be employed in future treatments in clinical neurological diseases. To optimize the integrated optrodes, this paper aimed to investigate the influence of surface material and illumination upon the performance of the microelectrode/electrolyte interface and build a corresponding evaluation system. In this work, an integrated planar optrode with a blue LED and microelectrodes was designed and fabricated. The charge transfer mechanism on the interface was theoretically modeled and experimentally verified. An evaluation system for assessing microelectrodes was also built up. Using this system, the proposed model of various biocompatible surface materials on microelectrodes was further investigated under different illumination conditions. The influence of illumination on the microelectrode/electrolyte interface was the cause of optical artifacts, which interfere the biological signal recording. It was found that surface materials had a great effect on the charge transfer capacity, electrical stability and recoverability, photostability, and especially optical artifacts. The metal with better charge transfer capacity and electrical stability is highly possible to have a better performance on the optical artifacts, regardless of its electrical recoverability and photostability under the illumination conditions of optogenetics. Among the five metals used in our investigation, iridium served as the best surface material for the proposed integrated optrodes. Thus, optimizing the surface material for optrodes could reduce optical interference, enhance the quality of the neural signal recording for optogenetics, and thus help to advance the research in neuroscience.

Keywords: microelectrode/electrolyte interface; optical artifact; optogenetics; optrode; photostability; surface material.

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Conflict of interest statement

The authors declare no conflict of interest.

Figures

Figure A1
Figure A1
5 μm × 5 μm AFM images of microelectrodes made of (a) Ti, (b) Cr, (c) Au, (d) Pt, (e) Ir.
Figure 1
Figure 1
(a) Top view and (b) cross-sectional view of the monolithic integrated planar optrode. (c) The picture of the proposed encapsulated integrated planar optrode. (d) The micrograph of the top area and (e) the micrograph of the wire-bonded area on the optrode.
Figure 2
Figure 2
(a) Theoretical model for the charge transfer mechanism on the microelectrode/electrolyte interface, in which the upper part displays faradaic processes and the lower part an EDL capacitor. (b) Equivalent circuit for the charge transfer mechanism on the interface.
Figure 3
Figure 3
(a) The proposed testing system for electrical characterizations with a semiconductor device analyzer or LCR meter in PBS with shielding. (b) The testing system for optical artifacts with amplifier and data acquisition card in PBS with shielding, while the optical artifacts are generated by a light-emitting diode driven by a pulse generator.
Figure 4
Figure 4
Electrochemical impedance spectroscopy (EIS) of microelectrodes with different surface materials, including Ti, Cr, Au, Pt and Ir.
Figure 5
Figure 5
(a) Experimental values and fitting result of ZM/E versus Cd (VRef = 0 and VLevel = 50 mV at 1 kHz). The insert is the Cd-VRef curve of microelectrodes with different surface materials measured within the range of −50 to 50 mV, representing the EDL capacitor. (b) ZM/E-VRef curves of microelectrodes with different surface materials measured within the range of 0 to 500 mV, characterizing the critical values and electrical stability of faradaic processes. (c) ZM/E values of microelectrodes with different surface materials measured before and after the faradaic processes (VRef = 0 and VLevel = 50 mV at 1 kHz).
Figure 6
Figure 6
The change of Cd versus the wavelength (VRef = 0 and VLevel = 50 mV at 1 kHz) of microelectrodes caused by different surface materials.
Figure 7
Figure 7
(a) The optical signal used in the testing system and the recorded optical artifacts of optrodes made by different surface materials, including (b) Ti, (c) Cr, (d) Au, (e) Pt, (f) Ir.
Figure 8
Figure 8
The correlation analyses between optical artifacts and (a) ZM/E, (b) the critical value Vc, (c) Cd and (d) the growth rate of Cd, respectively.

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