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. 2022 Apr 4;22(7):2770.
doi: 10.3390/s22072770.

Two High-Precision Proximity Capacitance CMOS Image Sensors with Large Format and High Resolution

Affiliations

Two High-Precision Proximity Capacitance CMOS Image Sensors with Large Format and High Resolution

Yuki Sugama et al. Sensors (Basel). .

Abstract

This paper presents newly developed two high-precision CMOS proximity capacitance image sensors: Chip A with 12 μm pitch pixels with a large detection area of 1.68 cm2; Chip B with 2.8 μm pitch 1.8 M pixels for a higher resolution. Both fabricated chips achieved a capacitance detection precision of less than 100 zF (10-19 F) at an input voltage of 20 V and less than 10 zF (10-20 F) at 300 V due to the noise cancelling technique. Furthermore, by using multiple input pulse amplitudes, a capacitance detection dynamic range of up to 123 dB was achieved. The spatial resolution improvement was confirmed by the experimentally obtained modulation transfer function for Chip B with various line and space pattens. The examples of capacitance imaging using the fabricated chips were also demonstrated.

Keywords: CMOS; high precision; high resolution; image sensor; large format; proximity capacitance.

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Conflict of interest statement

The authors declare no conflict of interests.

Figures

Figure 1
Figure 1
The 3D models of the sensor and the target, and the captured images for each target: (a) conductive target; (b) dielectric target; (c) particulate targets.
Figure 2
Figure 2
The schematics of the two chips: (a) the circuit block diagram; (b) the circuit schematic of the pixels.
Figure 3
Figure 3
Principle of operation of proximity capacitance image sensor: (a) simplified circuit and noise cancelling principle; (b) timing diagram of normal mode; (c) timing diagram of HDR mode.
Figure 4
Figure 4
The pixel layout diagrams of the two chips: (a) up to the 1st metal layer of Chip A; (b) up to the 1st metal layer of Chip B; (c) the top metal layer.
Figure 5
Figure 5
The micrograph of the fabricated CMOS proximity capacitance image sensors: (a) Chip A; (b) Chip B.
Figure 6
Figure 6
The cross-sectional pixel TEM image of the two chips: (a) Chip A; (b) Chip B.
Figure 7
Figure 7
The measurement system for characterizing the performance of fabricated sensor chips: (a) picture; (b) block diagram.
Figure 8
Figure 8
Various assembly methods of the sensor chips: (a) ceramic package with bonding wires; (b) resin potting; (c) polyimide film with flexible wires.
Figure 9
Figure 9
Captured images without and with noise cancelling and their histograms in the absence of targets: (a) Chip A; (b) Chip B.
Figure 10
Figure 10
Measurement to determine the capacitance value of CC: (a) sensor chip irradiated with light; (b) pulse timing; (c) histogram of measured CC of Chip B and CC values of the two chips.
Figure 11
Figure 11
Measured transfer characteristics of the two chips: (a) measurement methods; (b) Chip A; (c) Chip B.
Figure 12
Figure 12
Calculation of capacitance and distance detection precision: (a) cross-sectional schematic diagram of a chip surface and a conductor target with small irregularities; (b) calculation results of the relation between the measurement capacitance CS and the capacitance detection precision ΔCSmin at each input voltage VIN; (c) relation between the reference distance x between the chip surface and the target and the distance detection precision Δxmin.
Figure 13
Figure 13
Resolution measurement of Chip B: (a) cross-sectional structure of the chip with metal wiring created on the surface; (b) captured images of the wiring for each pitch; (c) output signal for each pixel when 20 µm pitch wiring captured by Chip B; (d) MTF calculated from the measurement results.
Figure 14
Figure 14
Captured image of a fingerprint by the large format Chip A (blurred for privacy).
Figure 15
Figure 15
Captured images of a general-purpose logic IC (TC74HC02): (a) captured by optical image sensor using a microscope; (b) captured by Chip A; (c) captured by Chip B.
Figure 16
Figure 16
Comparison of images captured of a general-purpose IC chip with the sensor operating in normal mode and HDR mode: (a) Normal mode; (b) HDR mode.
Figure 17
Figure 17
Captured images of a drop of saline solution on the sensor surface drying out as time advances captured by Chip B: (a) sample images; (b) closed-up images of red rectangle in (a).
Figure 18
Figure 18
Captured images of printed circuit board wiring by optical image sensor and Chip A: (a) no defects; (b) open defect; (c) short defect. φC was applied only to the center wire indicated by the red arrows.
Figure 19
Figure 19
Captured image of flat panel display with a line defect by Chip A.
Figure 20
Figure 20
Benchmark comparison with other sensors [6,9,10,11,12,13,14,15,16,17,18,19,20,21,22,23,26]: (a) comparison of detection precision and pixel area; (b) comparison of detection precision and pixel pitch and examples of target.

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