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. 2023 Jul 28;16(15):5318.
doi: 10.3390/ma16155318.

Properties of SiCN Films Relevant to Dental Implant Applications

Affiliations

Properties of SiCN Films Relevant to Dental Implant Applications

Xinyi Xia et al. Materials (Basel). .

Abstract

The application of surface coatings is a popular technique to improve the performance of materials used for medical and dental implants. Ternary silicon carbon nitride (SiCN), obtained by introducing nitrogen into SiC, has attracted significant interest due to its potential advantages. This study investigated the properties of SiCN films deposited via PECVD for dental implant coatings. Chemical composition, optical, and tribological properties were analyzed by adjusting the gas flow rates of NH3, CH4, and SiH4. The results indicated that an increase in the NH3 flow rate led to higher deposition rates, scaling from 5.7 nm/min at an NH3 flow rate of 2 sccm to 7 nm/min at an NH3 flow rate of 8 sccm. Concurrently, the formation of N-Si bonds was observed. The films with a higher nitrogen content exhibited lower refractive indices, diminishing from 2.5 to 2.3 as the NH3 flow rate increased from 2 sccm to 8 sccm. The contact angle of SiCN films had minimal differences, while the corrosion rate was dependent on the pH of the environment. These findings contribute to a better understanding of the properties and potential applications of SiCN films for use in dental implants.

Keywords: PECVD film deposition; chemical composition; dental implants; optical; surface coating; ternary silicon carbon nitride (SiCN); tribological properties.

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Conflict of interest statement

The authors declare no conflict of interest.

Figures

Figure 1
Figure 1
Deposition rate and N atom percentage for SiCN film with varying NH3 flow rates.
Figure 2
Figure 2
XPS survey scans of SiCN film deposited with 300 sccm SiH4, 4 sccm NH3, and 100 sccm CH4.
Figure 3
Figure 3
Deconvoluted high-resolution XPS spectra of (a) Si2p, (b) C1s (deconvoluted into two peaks, C-Si (green peak), C-C or C-H (red peak)), and (c) N1s core-level peaks (deconvoluted into two peaks, Si-N (red peak) and Si-C (brown peak)) for SiCN deposited with different NH3 flow rates.
Figure 4
Figure 4
Deconvoluted high-resolution XPS spectra of (a) Si2p, (b) C1s (deconvoluted into two peaks, C-Si (green peak), C-C or C-H (red peak)), and (c) N1s core-level peaks (deconvoluted into two peaks, Si-N (red peak) and Si-C (brown peak)) for SiCN deposited with different CH4 flow rates.
Figure 5
Figure 5
Deconvoluted high-resolution XPS spectra of (a) Si2p, (b) C1s (deconvoluted into two peaks, C-Si (green peak), C-C or C-H (red peak)), and (c) N1s core-level peaks (deconvoluted into two peaks, Si-N (red peak) and Si-C (brown peak)) for SiCN deposited with different SiH4 flow rates.
Figure 6
Figure 6
Refractive indices of SiCN films deposited with various NH3 flow rates.
Figure 7
Figure 7
Contact angles of SiCN films deposited with various NH3 flow rates.
Figure 8
Figure 8
Corrosion rates of SiCN films deposited with varying NH3 flow rates in solutions with pH values of 2, 7, and 10.

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