Correction: Self-limiting stoichiometry in SnSe thin films

Affiliations

¹ The School of Materials Science and Engineering, Georgia Institute of Technology, Atlanta, Georgia 30332-0245, USA. lauren.garten@mse.gatech.edu.
² Department of Materials Science and Engineering, The Pennsylvania State University, University Park, Pennsylvania 16802, USA.
³ Materials Research Institute, The Pennsylvania State University, University Park, Pennsylvania 16802, USA.
⁴ Paul-Drude Institut für Festkörperelektronik Berlin, Leibniz-Institut im Forschungsverbund Berlin eV., Berlin 10117, Germany.
⁵ Department of Mechanical Engineering, The Pennsylvania State University, University Park, Pennsylvania 16802, USA.
⁶ Physics Department, Karamanoglu Mehmetbey University, Karaman, 70000, Turkey.

PMID: 37877894
DOI: 10.1039/d3nr90187d

Published Erratum

Correction: Self-limiting stoichiometry in SnSe thin films

Jonathan R Chin et al. Nanoscale. 2023.

. 2023 Nov 2;15(42):17216.

doi: 10.1039/d3nr90187d.

Authors

Affiliations

¹ The School of Materials Science and Engineering, Georgia Institute of Technology, Atlanta, Georgia 30332-0245, USA. lauren.garten@mse.gatech.edu.
² Department of Materials Science and Engineering, The Pennsylvania State University, University Park, Pennsylvania 16802, USA.
³ Materials Research Institute, The Pennsylvania State University, University Park, Pennsylvania 16802, USA.
⁴ Paul-Drude Institut für Festkörperelektronik Berlin, Leibniz-Institut im Forschungsverbund Berlin eV., Berlin 10117, Germany.
⁵ Department of Mechanical Engineering, The Pennsylvania State University, University Park, Pennsylvania 16802, USA.
⁶ Physics Department, Karamanoglu Mehmetbey University, Karaman, 70000, Turkey.

PMID: 37877894
DOI: 10.1039/d3nr90187d

Abstract

Correction for 'Self-limiting stoichiometry in SnSe thin films' by Jonathan R. Chin et al., Nanoscale, 2023, 15, 9973-9984, https://doi.org/10.1039/D3NR00645J.

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Erratum for

Self-limiting stoichiometry in SnSe thin films.
Chin JR, Frye MB, Liu DS, Hilse M, Graham IC, Shallenberger J, Wang K, Engel-Herbert R, Wang M, Shin YK, Nayir N, van Duin ACT, Garten LM. Chin JR, et al. Nanoscale. 2023 Jun 15;15(23):9973-9984. doi: 10.1039/d3nr00645j. Nanoscale. 2023. PMID: 37272496

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Correction: Self-limiting stoichiometry in SnSe thin films

Affiliations

Correction: Self-limiting stoichiometry in SnSe thin films

Authors

Affiliations

Abstract

Erratum for

Publication types

LinkOut - more resources

Full Text Sources