Skip to main page content
U.S. flag

An official website of the United States government

Dot gov

The .gov means it’s official.
Federal government websites often end in .gov or .mil. Before sharing sensitive information, make sure you’re on a federal government site.

Https

The site is secure.
The https:// ensures that you are connecting to the official website and that any information you provide is encrypted and transmitted securely.

Access keys NCBI Homepage MyNCBI Homepage Main Content Main Navigation
. 2024 Feb 23;17(5):1026.
doi: 10.3390/ma17051026.

The Influence of B4C Film Density on Damage Threshold Based on Monte Carlo Method for X-ray Mirror

Affiliations

The Influence of B4C Film Density on Damage Threshold Based on Monte Carlo Method for X-ray Mirror

Tingting Sui et al. Materials (Basel). .

Abstract

The uniformity and consistency of X-ray mirror film materials prepared by experimental methods are difficult to guarantee completely. These factors directly affect the service life of free electron laser devices in addition to its own optical properties. Therefore, the quality of the film material, especially the density, has a critical effect on its application. Boron carbide film and monocrystalline silicon substrate were suitable examples to explore their influence of density on the damage threshold based on Monte Carlo and heat-conduction methods. Through simulation results, it was found that the change in film density could affect the energy deposition depth and damage threshold. When the film density was 2.48 g/cm3, it had relatively high damage threshold in all energy ranges. And then the specific incident parameter for practical application was investigated. It was found that the damage mechanism of the B4C/Si was the melting of the interface. And the damage threshold was also higher with the film density of 2.48 g/cm3. Therefore, it was recommended to maintain the density at this value as far as possible when preparing the film, and to ensure the uniformity and consistency of the film material.

Keywords: B4C film; Monte Carlo; XFEL; damage threshold; density.

PubMed Disclaimer

Conflict of interest statement

The authors declare no conflicts of interest.

Figures

Figure 1
Figure 1
The diagram of the sample.
Figure 2
Figure 2
Relationship between cross section and photon energy of B4C.
Figure 3
Figure 3
Damage threshold and reflectivity at different photon energy for B4C/Si.
Figure 4
Figure 4
Energy deposition depth (a), damage threshold (b), film absorptivity (c) and photoelectron emission rate (d) with different photon energy at different density of B4C film.
Figure 5
Figure 5
Energy deposition depth with damage threshold (a) and the photoelectron emission rate with damage threshold (b) at different incident parameter for B4C/Si.
Figure 6
Figure 6
The distribution of enthalpy of B4C/Si with depth and time. (a) Enthalpy-depth distribution with 3.6 mrad@3 keV; (b) enthalpy-depth distribution with 1.1 mrad@25 keV; (c) time-depth for distribution of enthalpy with 3.6 mrad@3 keV; (d) time-depth for distribution of enthalpy with 1.1 mrad@25 keV.
Figure 7
Figure 7
The damage threshold with the change in density of film at designed parameters.

Similar articles

References

    1. Emma P., Akre R., Arthur J., Bionta R., Bostedt C., Bozek J., Brachmann A., Bucksbaum P., Coffee R., Decker F.-J., et al. First lasing and operation of an ång-strom-wavelength free-electron laser. Nat. Photonics. 2010;4:641–647. doi: 10.1038/nphoton.2010.176. - DOI
    1. Bostedt C., Boutet S., Fritz D.M., Huang Z., Lee H.J., Lemke H.T., Robert A., Schlotter W.F., Turner J.J., Williams G.J. Linac Coherent Light Source: The first five years. Rev. Mod. Phys. 2016;88:015007. doi: 10.1103/RevModPhys.88.015007. - DOI
    1. Ackermann W., Asova G., Ayvazyan V., Azima A., Baboi N., Bähr J., Balandin V., Beutner B., Brandt A., Bolzmann A., et al. Operation of a free-electron laser from the extreme ultraviolet to the water window. Nat. Photonics. 2007;1:336–342. doi: 10.1038/nphoton.2007.76. - DOI
    1. Allaria E., Appio R., Badano L., Barletta W., Bassanese S., Biedron S., Borga A., Busetto E., Castronovo D., Cinquegrana P., et al. Highly coherent and stable pulses from the FERMI seeded free-electron laser in the extreme ultraviolet. Nat. Photonics. 2012;6:699–704. doi: 10.1038/nphoton.2012.233. - DOI
    1. Morawe C. Multilayer based x-ray optics at the ESRF; Proceedings of the 13th International Conference on Synchrotron Radiation Instrumentation—SRI2018; Taipei, Taiwan. 11–15 June 2018; p. 060002.

Grants and funding

LinkOut - more resources