Non-perturbative cathodoluminescence microscopy of beam-sensitive materials
- PMID: 40470094
- PMCID: PMC12133309
- DOI: 10.1515/nanoph-2024-0724
Non-perturbative cathodoluminescence microscopy of beam-sensitive materials
Abstract
Cathodoluminescence microscopy is now a well-established and powerful tool for probing the photonic properties of nanoscale materials, but in many cases, nanophotonic materials are easily damaged by the electron-beam doses necessary to achieve reasonable cathodoluminescence signal-to-noise ratios. Two-dimensional materials have proven particularly susceptible to beam-induced modifications, yielding both obstacles to high spatial-resolution measurement and opportunities for beam-induced patterning of quantum photonic systems. Here pan-sharpening techniques are applied to cathodoluminescence microscopy in order to address these challenges and experimentally demonstrate the promise of pan-sharpening for minimally-perturbative high-spatial-resolution spectrum imaging of beam-sensitive materials.
Keywords: 2D materials; cathodoluminescence; color centers.
© 2025 the author(s), published by De Gruyter, Berlin/Boston.
Conflict of interest statement
Conflict of interest: Authors state no conflict of interest.
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