Nanomechanical Characterization via Atomic Force Microscopy

Abstract

In situ high-resolution imaging of mechanical behavior is an important research topic for optimizing the performance and enhancing the stability of flexible electronic devices. Specifically, during bending, twisting, and stretching processes, the mechanical responses and conformal deformation behaviors at interfaces complicate the measurement of the mechanical properties on the nanometer scale. This poses a significant challenge for high-resolution mechanical imaging technology. Nanomechanical mapping using atomic force microscopy (AFM-based NMM) has been an essential method for the study of flexible electronic fields, which not only enables nondestructive high-resolution imaging but also allows for real-time detection and analysis of the dynamic mechanical responses under mechanical stimuli. This review systematically examines recent advances, applications, and challenges in AFM-based NMM for the study of nanomechanics, including the experimental methodologies for sample preparation, manipulation, measurement, the theoretical contact models governing the tip-sample surface interactions, and the dependence of the nanomechanical properties on the size effects, substrate effects, interface effects, and anisotropy. These insights are of paramount importance for developing potential materials with superior mechanical properties, optimizing the designs of flexible electronic devices, and ultimately enhancing their performance.

Keywords: AFM-based nanomechanical mapping; atomic force microscopy; flexible materials; high-resolution imaging; nanomechanical properties.