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. 2025 Dec 9;10(50):62182-62188.
doi: 10.1021/acsomega.5c09705. eCollection 2025 Dec 23.

Engineering Amorphous IGZO Thin-Film Transistors: The Role of Composition and Channel Thickness in Mobility-Threshold Voltage Optimization

Affiliations

Engineering Amorphous IGZO Thin-Film Transistors: The Role of Composition and Channel Thickness in Mobility-Threshold Voltage Optimization

Taehyun Kim et al. ACS Omega. .

Abstract

Recently, it has been shown that the mobility of amorphous InGaZnO (a-IGZO) thin-film transistors (TFTs) depends strongly on channel thickness and metal composition (In/Ga/Zn), resulting in a mobility-threshold voltage (V th) trade-off. To the best of our knowledge, this work provides the first comprehensive modeling study systematically integrating density functional theory (DFT) and machine learning potential (MLP) to capture structural disorder and thickness effects on mobility-V th in amorphous IGZO. We establish the existence of a universal mobility-V th trade-off across diverse IGZO compositions and channel thicknesses. To unveil the origin of the universal trend, we developed a mobility model that covers the full composition and thickness of a-IGZO with composition-resolved parameters using DFT and MLP, taking into account its stochastically and structurally driven variation of the amorphous material's properties. We found that the origin of the mobility-V th trade-off is the strong dependence of both mobility and V th on the carrier concentration. Despite the existence of the mobility-V th trade-off, as a method for designing enhancement-mode devices with high mobility, we propose increasing the Zn content to reduce the structural disorder.

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Figures

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Schematic framework for mobility and V th modeling, integrating atomistic simulations and the BTE-based scattering model across various a-IGZO compositions. (a–b) Iterative training process of MLP to span the entire composition space of a-IGZO. (c) Structure generation via MLP-interfaced MD for each composition. (d) Validation of generated structures: comparison of metal-oxygen radial distribution functions (RDF) obtained from DFT and MLP (left), and the inverse participation ratio of the generated 1:1:1 a-IGZO structure (right). RDFs for other compositions are presented in Figure S2. (e) Calculation of electronic parameters (highlighted in red) from DFT simulation, used for the mobility model. (f) Construction of a BTE mobility model incorporating quantum confinement effects for the V th model.
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A ternary map of (a) effective mass, (b) ρSD, (c) band gap, and (d) carrier concentration of a-IGZOs. The data presented on the ternary maps represent averages over ten different a-IGZO for each composition. The carrier concentration is calculated based on the band gap values, as detailed in the main text.
3
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Three factors (E F, ρ SD, and m*) affecting mobility and their extent for various compositions. (a) The mobility value of compositions, contributed by composition-dependent factors, and (b) the corresponding mobility changes. E F is the most dominant factor, but ρSD also has an impact on compositions containing Zn. The effect of the dielectric constant is negligible, which is not shown here.
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Ternary maps of predicted mobility incorporating composition-dependent m e and E F values: (a) without ρSD dependence and (b) ρSD dependence included. (c) Comparison of the mobility values of five different compositions, In/Ga/Zn = 1:1:1, 1:1:6, 2:0:1, 4.6:1:1, and 1:0:0, between experimental measurements and model predictions. The composition of maximum mobility changes from In-rich to In2Zn1O4 with 41.4 cm2/V·s.
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(a) An illustration of the mobility change caused by the reduction of thickness and carrier concentration that makes the barrier relatively high. (b) Owing to the relation of mobility and E F, a mobility and V th trade-off arises, marked by the black dashed line. In the absence of any compositional change, the mobility values consistently lie on the curve, even with varying thickness and carrier concentration (or E F). (c) For different values of ρSD, the curves split: an orange-colored line indicates Zn-rich composition with the lowest ρSD, while the purple corresponds to the In-rich composition with the highest ρSD. (d) Comparison between the experimental mobility-V th values of TFTs ,,− and the predicted values.
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(a) The analytical model is derived in the nondegenerate region and the degenerate region using approximations. This simple equation clarifies the mobility dependence on E F, where ηF = (E FE C) / (k B T) and Fi is the Fermi Dirac integral. The analytical model agrees well with the numerical model in the energy range where electrons can exist at room temperature. The analytical model also exhibits temperature dependency as well as E F dependency. The coefficients M and α are presented in Supporting Information S9. (b) The mobility values, calculated by the analytical model, are plotted to compare with experimental data, at ρSD = 1.59 × 1026 m–3. The curve is matched well with the AOS TFT experiment data. The legend is the same as in Figure d.

References

    1. Zheng, D. ; Charnas, A. ; Anderson, J. ; Dou, H. ; Hu, Z. ; Lin, Z. ; Zhang, Z. ; Zhang, J. ; Liao, P.-Y. ; Si, M. ; Wang, H. ; Weinstein, D. ; Ye, P. D. . First Demonstration of BEOL-Compatible Ultrathin Atomic Layer-Deposited InZnO Transistors with GHz Operation and Record High Bias-Stress Stability. In 2022 International Electron Devices Meeting (IEDM); IEEE, 2022; pp 431–434.
    1. Hikake, K. ; Huang, X. ; Kim, S. ; Sakai, K. ; Li, Z. ; Mizutani, T. ; Saraya, T. ; Hiramoto, T. ; Takahashi, T. ; Uenuma, M. ; Uraoka, U. ; Kobayashi, M. . Scaling Potential of Nanosheet Oxide Semiconductor FETs for Monolithic 3D Integration–ALD Material Engineering, High-Field Transport, Statistical Variability. In 2024 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits); IEEE, 2024; pp 1–2.In:
    1. Ha, D. ; Lee, W. ; Cho, M. H. ; Terai, M. ; Yoo, S.-W. ; Kim, H. ; Lee, Y. ; Uhm, S. ; Ryu, M. ; Sung, C. ; Song, Y. ; Lee, K. ; Park, S. W. ; Lee, K.-S. ; Tak, Y. S. ; Hwang, E. ; Chae, J. ; Im, C. ; Byeon, S. ; Hong, M. ; Sim, K. ; Jung, W. J. ; Ryu, H. ; Hong, M. J. ; Park, S. ; Park, J. ; Choi, Y. ; Lee, S. ; Woo, G. ; Lee, J. ; Kim, D. S. ; Kuh, B. J. ; Shin, Y. G. ; Song, J. . Highly Manufacturable, Cost-Effective, and Monolithically Stackable 4F2 Single-Gated IGZO Vertical Channel Transistor (VCT) for sub-10nm DRAM. In 2023 International Electron Devices Meeting (IEDM); IEEE, 2023; pp 1–4.
    1. Kang Y., Cho Y., Han S.. Cation disorder as the major electron scattering source in crystalline InGaZnO. Appl. Phys. Lett. 2013;102:152104. doi: 10.1063/1.4802093. - DOI
    1. Lundstrom, M. Fundamentals of Carrier Transport, 2nd ed ed.; Cambridge Univ. Press: Cambridge, U.K., 2000.

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